Niobium carbide NbC Sputtering targets use in thin film coating CAS 12069-94-2

Niobium carbide NbC Sputtering targets use in thin film coating CAS 12069-94-2

Model No.︰NbC

Brand Name︰TYR

Country of Origin︰China

Unit Price︰US $ 200 / pc

Minimum Order︰1 pc

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Product Description

 

Niobium Carbide (NbC) sputtering targets 

Purity: 99.5%

Sputtering Targets : Diameter: 355.6mm (14") max. 

Single piece Size: Length: <254mm, Width: <127mm, Thickness: >1mm, 

if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree

 

Niobium carbide (NbC and Nb2C) is an extremely hard refractory ceramic material, commercially used in tool bits for cutting tools. It is usually processed by sintering and is a frequent additive as grain growth inhibitor in cemented carbides. It has the appearance of a brown-gray metallic powder with purple lustre. It is highly corrosion resistant.

Niobium carbide is a frequent intentional product in microalloyed steels due to its extremely low solubility product in austenite, the lowest of all the refractory metal carbides. This means that micrometre-sized precipitates of NbC are virtually insoluble in steels at all processing temperatures and their location at grain boundaries helps prevent excessive grain growth in these steels. This is of enormous benefit, and the cornerstone of microalloyed steels, because it is their uniform, very fine grain size that ensures both toughness and strength. The only commonly occurring compound with a lower solubility and hence, greater potential for restricting the grain growth of steels is titanium nitride.

Depending on grain size, niobium carbide may burn at 200-800 °C in air. A layer of niobium carbide can be created by chemical vapor deposition. Zirconium carbide and niobium carbide can be used as refractory coatings in nuclear reactors.

 

Application:

used as refractory coatings in nuclear reactors.

Molar mass: 104.917g/mol
Density: 7.82g/cm3
Melting point: 3,608 °C (6,526 °F; 3,881 K)

 

 

 

We also supply below carbide sputtering targets material:
 
Chromium Carbide Cr2C3, CrC
 
Hafnium Carbide  HfC
 
Niobium Carbide  NbC
 
Silicide Carbide  SiC
 
Tantalum Carbide  TaC
 
Titanium Carbide  TiC
 
Tungsten Carbide  WC
 
Vanadium Carbide  VC
 
Zirconium Carbide  ZrC
 
Tantalum Hafnium Carbide   Ta4HfC5

 

specification︰ Sputtering film coating, evaporation materials, hard alloy additive as carbide. Also available for purple artificial stones.

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