Product Description

Nickel (Ni) metal, CAS: 7440-02-0, sputtering target use in Decorate thin film coating

purity: 99.95%, 99.995%, 99.999%

Size: diameter: 457.2mm max.

length 1500mm max. x width 250mm max.

Shape: Plate, bar, chip, silk, powder, discs, disks, step disk, delta but also according to the customer's drawing processing.

 

 

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We also supply below material:

Material Name	Formula	Purity
Aluminum	Al	99.99%, 99.999%
Antimony	Sb	99.99%, 99.999%
Boron	B	99.9%,99.99%, 99.999%
Barium	Ba	99.3%, 99.9%, 99.95%
Bismuth	Bi	99.99%, 99.999%
Graphite	C	99.99%
Cobalt	Co	99.9%, 99.95%, 99.99%
Chromium	Cr	99.5%, 99.9%, 99.95%
Copper	Cu	99.99%, 99.999%
Cadmium	Cd	99.99%
Iron	Fe	99.9%, 99.99%
Indium	In	99.9%, 99.99%,99.999%
Lithium	Li	99.5%
Molybdenum	Mo	99.95%
Magnesium	Mg	99.95%
Nickel	Ni	99.9%, 99.98%, 99.995%, 99.999%
Niobium	Nb	99.95%
Lead	Pb	99.99%
Rhenium	Re	99.95%, 99.99%
Silicon	Si	99.999%, 99.9999%,poly or mono crystal, doped or undoped
Selenium	Se	99.99%, 99.999%
Tellurium	Te	99.99%,99.999%
Tantalum	Ta	99.95%, 99.99%
Titanium	Ti	99.7%, 99.99%, 99.995%, 99.999%
Tin	Sn	99.99%, 99.999%
Tungsten	W	99.95%
Vanadium	V	99.9%

 

specification︰ purity: 99.95%, 99.995%, 99.999%
Size: diameter: 457.2mm max.
length 1500mm max. x width 250mm max.
Shape: Plate, bar, chip, silk, powder, discs, disks, step disk, delta but also according to the customer's drawing processing.

Label︰ Nickel (Ni) metal sputtering targets

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